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조우현 · 최두호
스퍼터링법으로 증착된 ZnO/Ag/ZnO 투명전극의 성능 최적화 연구(Optimization of ZnO/Ag/ZnO Transparent Conductive Electrodes Fabricated by Magnetron Sputtering)
Received: 19 December 2018;  Accepted: 8 January 2019.  Published online: 11 January 2019.
The critical role of the thicknesses of the top and bottom oxide layers, as well as Ag layer, in ZnO/Ag/ZnO transparent conductive electrodes was investigated. The Ag forms a nearly continuous layer at the thickness of 8 nm, at which the Ag sheet resistance of 8.0 Ω/Sq. is lower than the typical criteria of 10 Ω/Sq. By making independent changes in the thickness of the top and bottom ZnO layers, which serve as antireflection layers, it was found that the top ZnO layer thickness has a dominant impact, with the bottom ZnO layer thickness contributing a less but still significant amount. The optimized thicknesses for the top and bottom ZnO layers were found to be 40 and 20-30 nm, respectively, resulting in a peak transmittance of 97.1% and average visible light transmittance of 90.8%. According to the Haccke figure of merit ( ), the value for the optimized ZnO/Ag/ZnO electrode was 0.048, which is highly competitive for transparent conductive electrodes for future optoelectronic devices.
Keywords: transparent conductive electrodes, thin films, transmittance, sheet resistance
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