| Title |
Research Papers / Surface Treatment : Etching of ITO ( Indium Tin Oxide ) Thin Flims by Low Temperature Plasma Torch at Atmospheric Pressure |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Abstract |
We have investigated the etching possibility of ITO(Indium Tin Oxide) thin films by using the plasma that was developed to generate a low-temperature plasma torch at atmospheric pressure. Hydrogen and methane radicals generated from the plasma were observed and their intensity was found to be dependent on the methane flow rate due to an analysis with optical emission spectroscopy. The etching ability of this plasma was evaluated by the evaluation of methane radicals emission intensity. |