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Korean Journal of Metals and Materials > Epub ahead of print
최운섭
전기수력학젯 분산 기술을 이용한 아연-주석 산화물 박막트랜지스터의 인듐 도핑 효과
Received: 22 January 2019;  Accepted: 5 March 2019.  Published online: 8 March 2019.
ABSTRACT
The effect of indium doping on zinc-tin oxide thin-film transistor was investigated using electrohydrodynamic (EHD) jet spray technology. EHD jet spray is a new and unique drop-on-demand patterning technology for printed electronics. After optimizing process parameters, the EHD jet spraying conditions were determined to be a voltage of 4.5 kV, a syringe speed of 0.032 μm/s, spraying time of 10 s, and a substrate temperature of 50 oC. Indium doping increased metal-oxide formation in the thin-film, as confirmed by XPS. In addition, improved TFT electrical properties were obtained compared with non-doped TFTs by using EHD jet spray. A 0.1 M In-doped ZTO TFT showed a mobility of 7.40 cm2/V s, a threshold voltage of -3.4 V, an on-to-off current ratio of 1.87 × 106, and a sub-threshold slope of 1.2 V/dec. Improved hysteresis behavior of the TFT was also achieved by indium doping.
Keywords: EHD jet, spray, ZTO TFT, Indium doping
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