Study of Novel EUV Absorber´╝ÜNickel & Nickel Oxide
Dong Gon Woo, Jung Hwan Kim, Jung Sik Kim, Seongchul Hong, Jinho Ahn
Korean J. Met. Mater.. 2017;55(3):198-201.   Published online 2017 Mar 3     DOI: https://doi.org/10.3365/KJMM.2017.55.3.198
Citations to this article as recorded by Crossref logo
RESCAN: an actinic lensless microscope for defect inspection of EUV reticles
Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Rajendran Rajeev, Dimitrios Kazazis, Shusuke Yoshitake, Yasin Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS.2017; 16(4): 041003.     CrossRef