 |
|
Fluorine-based Inductively Coupled Plasma Etching of α-Ga2O3 Epitaxy Film
Ji Hun Um, Byoung Su Choi, Woo Sik Jang, Sungu Hwang, Dae-Woo Jeon, Jin Kon Kim, Hyun Cho
Korean J. Met. Mater.. ;59(2):121-126. Published online 2021 Jan 27 DOI: https://doi.org/10.3365/KJMM.2021.59.2.121
|
|
Citations to this article as recorded by
 Progress and challenges in the development of ultra-wide bandgap semiconductor α-Ga2O3 toward realizing power device applications
Yuichi Oshima, Elaheh Ahmadi
Applied Physics Letters.2022;[Epub] CrossRef
|