Influence of the Thickness of TiO2/TiO2-x Layers on the Behavior of a Memristor Device
Han-Sang Kim, Sung-Jin Kim
Korean J. Met. Mater.. 2019;57(2):84-90.   Published online 2019 Feb 5     DOI: https://doi.org/10.3365/KJMM.2019.57.2.84
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