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Effect of Post-Deposition Annealing on the Structural, Optical and Electrical Properties of Ti-doped Indium Oxide Thin Films
Sung-Bo Heo, Hyun-Joo Moon, Jeong-Hyeon Oh, Young-Hwan Song, Tae-Young Eom, Jun-Ho Kim, Daeil Kim
Korean J. Met. Mater. 2016;54(10):775-779.   Published online 2016 Oct 5
DOI: https://doi.org/10.3365/KJMM.2016.54.10.775

Abstract
Ti-doped In2O3 (TIO) thin films were deposited on glass substrates by RF magnetron sputtering. The films were then annealed at 100, 200 or 300 °C for 30 min to investigate the effects of the annealing temperature on the films’ structural, electrical and optical properties. The films annealed at 200 °C..... More

      
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