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Optimization of Electrochemical Variables of Pulse-Reverse Electroplating in Trivalent Chromium Bath to Enhance the Corrosion Resistance of Chromium Film
3가 크롬 도금욕에서 펄스 도금의 전기화학적 변수 최적화를 통한 크롬 도금막의 내식성 향상 연구
Chaewon Lim, Dongwook Lim, Bonil Ku, Sang Eun Shim, Sung-Hyeon Baeck
임채원, 임동욱, 구본일, 심상은, 백성현
Korean J. Met. Mater. 2019;57(10):641-647.   Published online 2019 Sep 6
DOI: https://doi.org/10.3365/KJMM.2019.57.10.641

Abstract
Electroplating chromium films in a trivalent chromium bath has been extensively investigated as a replacement for the conventional hexavalent chromium bath. However, commercialization of the trivalent chromium method has been hindered because the resulting chromium films exhibit inferior mechanical properties compared to hexavalent chromium coated film. In this study, we..... More

                
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