Abstract
Transparent TiO₂ single layer and TiO₂/Ag/TiO₂(TAT) tri-layer films were deposited by DC and RF magnetron sputter on a polyimide substrate at room temperature. During the TAT deposition, the thickness of the TiO₂ layer was kept at 20 nm, while the Ag interlayer was varied as 10, 15, 20 nm to..... More

Abstract
Transparent conductive ZnO 50 nm/Ag 10 nm/SnO₂ 50 nm (ZAS) tri-layer films were deposited on glass substrates by magnetron sputtering, and then the surface was subjected to intense electron beam irradiation to investigate the effects of electron irradiation on the structural, optical, and electrical properties of the films. After deposition,..... More

Abstract
ZnO 50 nm/Ag 10 nm/SnO₂ 50 nm (ZAS) tri-layer films were deposited on a glass substrate by RF and DC magnetron sputtering and then underwent rapid thermal annealing in a low vacuum of 1×10^-3 Torr to investigate the effects of post-deposition annealing on the optical and electrical properties of the..... More

Abstract
ZnO/Ag/SnO2 (ZAS) tri-layer films were prepared on glass substrates via RF and DC magnetron sputtering, and then the influence of the thickness of the ZnO and SnO2 layers on the optical and electrical properties of the ZAS films was investigated. As deposited ZnO 50 nm/Ag 10 nm/SnO2 50 nm films..... More