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Fabricating Elastomeric Photomask with Nanosized-Metal Patterns for Near-Field Contact Printing
Sangyoon Paik, Gwangmook Kim, Dongchul Seo, Wooyoung Shim
Korean J. Met. Mater. ;59(2):142-148.   Published online 2021 Jan 27
DOI: https://doi.org/10.3365/KJMM.2021.59.2.142

Abstract
When an elastomeric photomask is used for near-field contact printing, the high deformability of the elastomer mask plate enables gap-free full contact with the substrate, minimizing the effect of diffraction. This image-transfer technique provides sub-50 nm resolution and depth-of-focus-free lithographic capability with cost-efficient equipment. However, the method’s application is limited..... More

      
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