Korean J. Met. Mater. 2017;55(2):139-143. Published online 2017 Feb 2
DOI:
https://doi.org/10.3365/KJMM.2017.55.2.139
Abstract
The missing hole phenomenon in a wafer pattern is a critical issue in extreme ultraviolet lithography. It occurs randomly, even when the process conditions are consistent. The main reason for this phenomenon is thought to be the photon shot noise effect, which is a random reaction between photons and photoresist.....
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