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Effect of Ion Flux Variation in DC Magnetron Sputtering on the Deposition of Cubic Boron Nitride Film
DC 마그네트론 스퍼터링에서 입방정 질화붕소 박막의 증착 거동에 미치는 이온 플럭스 변화의 영향
Young-Hwan Choi, Joo-Youl Huh, Young-Joon Baik
최영환, 허주열, 백영준
Korean J. Met. Mater. 2023;61(11):824-829.   Published online 2023 Oct 29
DOI: https://doi.org/10.3365/KJMM.2023.61.11.824

Abstract
Cubic boron nitride (cBN) thin films were deposited using DC magnetron sputtering, and the effect of the ion flux on the deposition behavior and residual stress of the cBN thin films was investigated. To increase the ion flux, the magnetic force ratio of the central/peripheral permanent magnets inserted in the..... More

                
Flexible Transparent Planar Heater Comprising ZnO/Cu/Al<sub>2</sub>O<sub>3</sub>
ZnO/Cu/Al2O3 구조의 유연 투명 면상발열체 연구
Heechang Kim, Dooho Choi
김희창, 최두호
Korean J. Met. Mater. 2023;61(7):480-488.   Published online 2023 Jun 21
DOI: https://doi.org/10.3365/KJMM.2023.61.7.480

Abstract
In this study, we fabricated transparent heaters composed of an ultrathin Cu-layer heating element sandwiched between a ZnO underlayer and an Al2O3 overlayer. With the Cu layer thickness fixed at 8.5 nm, the thicknesses of the ZnO and Al2O3 layers were independently varied to reach the optimum antireflecting condition (maximum..... More

                
Enhanced Optical and Electrical Properties of Ti Doped In<sub>2</sub>O<sub>3</sub> thin Films Treated by Post-deposition Electron Beam Irradiation
Su-Hyeon Choe, Yun-Je Park, Yu-Sung Kim, Byung-Chul Cha, Sung-Bo Heo, Sungook Yoon, Young-Min Kong, Daeil Kim
Korean J. Met. Mater. 2020;58(11):793-797.   Published online 2020 Oct 15
DOI: https://doi.org/10.3365/KJMM.2020.58.11.793

Abstract
Transparent and conductive Ti doped In2O3 (TIO) films were prepared on slide glass substrate using a radio frequency (RF) magnetron sputter and then subjected to Transparent and conductive Ti doped In2O3 (TIO) films were prepared on a glass slide substrate using radio frequency (RF) magnetron sputter. The film surface was..... More

                   Web of Science 2  Crossref 1
Electron Irradiation Effects on the Optical and Electrical Properties of ZnO/Ag/SnO<sub>2</sub> Thin Films
Yu-Sung Kim, Jin-Young Choi, Yun-je park, Su-Hyeon Choe, Byung-Chul Cha, Young-Min Kong, Daeil Kim
Korean J. Met. Mater. 2020;58(3):190-194.   Published online 2020 Mar 5
DOI: https://doi.org/10.3365/KJMM.2020.58.3.190

Abstract
Transparent conductive ZnO 50 nm/Ag 10 nm/SnO2 50 nm (ZAS) tri-layer films were deposited on glass substrates by magnetron sputtering, and then the surface was subjected to intense electron beam irradiation to investigate the effects of electron irradiation on the structural, optical, and electrical properties of the films. After deposition,..... More

                   Web of Science 4  Crossref 3
Effects of Rapid Thermal Annealing on the Structural, Optical, and Electrical Properties of ZnO/Ag/SnO<sub>2</sub> Tri-Layer Films
Su-Hyeon Choe, Yu-Sung Kim, Jin-Young Choi, Yun-Je Park, Byung-Chul Cha, Young-Min Kong, Daeil Kim
Korean J. Met. Mater. 2019;57(8):506-509.   Published online 2019 Aug 5
DOI: https://doi.org/10.3365/KJMM.2019.57.8.506

Abstract
ZnO 50 nm/Ag 10 nm/SnO2 50 nm (ZAS) tri-layer films were deposited on a glass substrate by RF and DC magnetron sputtering and then underwent rapid thermal annealing in a low vacuum of 1×10-3 Torr to investigate the effects of post-deposition annealing on the optical and electrical properties of the..... More

                   Web of Science 4  Crossref 3
Effect of Process Parameters on the Angular Distribution of Sputtered Cu Flux in Long-Throw Sputtering System
Hee-Young Shin, Tae-Ho Kim, Jun-Woo Park, Hyun-Chul Sohn
Korean J. Met. Mater. 2019;57(7):462-467.   Published online 2019 Jun 5
DOI: https://doi.org/10.3365/KJMM.2019.57.7.462

Abstract
In this work, the angular distribution of the sputtered Cu flux in a long throw sputtering (LTS) system is extracted from the comparison of experimentally-measured profiles of deposited films with simulated profiles of films in overhang contact structure. And effects of the sputtering process parameters such as Ar pressure during..... More

                   Web of Science 1  Crossref 1
Influence of the Thickness of TiO<sub>2</sub>/TiO<sub>2-x</sub> Layers on the Behavior of a Memristor Device
TiO2/TiO2-x 박막층의 두께가 멤리스터 소자의 특성에 미치는 영향
Han-Sang Kim, Sung-Jin Kim
김한상, 김성진
Korean J. Met. Mater. 2019;57(2):84-90.   Published online 2019 Feb 5
DOI: https://doi.org/10.3365/KJMM.2019.57.2.84

Abstract
Memristors have been extensively investigated as the fourth fundamental circuit element. Titanium oxide is a common material used to fabricate memristors. In this paper, we investigated the influence of the thickness of the oxide active layer on the Al/TiO2-x/TiO2/heavily doped electrode memristor architecture. An insulating TiO2 thin-film was deposited using..... More

                   Web of Science 5  Crossref 6
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