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Korean J. Met. Mater.
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Korean Journal of Metals and Materials
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DC 마그네트론 스퍼터링에서 입방정 질화붕소 박막의 증착 거동에 미치는 이온 플럭스 변화의 영향
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최영환, 허주열, 백영준
Korean J. Met. Mater.
2023;61(11):824-829. Published online 2023 Oct 29
DOI:
https://doi.org/10.3365/KJMM.2023.61.11.824
Abstract
Cubic boron nitride (cBN) thin films were deposited using DC magnetron sputtering, and the effect of the ion flux on the deposition behavior and residual stress of the cBN thin films was investigated. To increase the ion flux, the magnetic force ratio of the central/peripheral permanent magnets inserted in the.....
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ZnO/Cu/Al
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O
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구조의 유연 투명 면상발열체 연구
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김희창, 최두호
Korean J. Met. Mater.
2023;61(7):480-488. Published online 2023 Jun 21
DOI:
https://doi.org/10.3365/KJMM.2023.61.7.480
Abstract
In this study, we fabricated transparent heaters composed of an ultrathin Cu-layer heating element sandwiched between a ZnO underlayer and an Al
2
O
3
overlayer. With the Cu layer thickness fixed at 8.5 nm, the thicknesses of the ZnO and Al
2
O
3
layers were independently varied to reach the optimum antireflecting condition (maximum.....
More
Web of Science 2
Crossref 1
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Korean J. Met. Mater.
2020;58(11):793-797. Published online 2020 Oct 15
DOI:
https://doi.org/10.3365/KJMM.2020.58.11.793
Abstract
Transparent and conductive Ti doped In
2
O
3
(TIO) films were prepared on slide glass substrate using a radio frequency (RF) magnetron sputter and then subjected to Transparent and conductive Ti doped In
2
O
3
(TIO) films were prepared on a glass slide substrate using radio frequency (RF) magnetron sputter. The film surface was.....
More
Web of Science 2
Crossref 1
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Korean J. Met. Mater.
2020;58(3):190-194. Published online 2020 Mar 5
DOI:
https://doi.org/10.3365/KJMM.2020.58.3.190
Abstract
Transparent conductive ZnO 50 nm/Ag 10 nm/SnO
2
50 nm (ZAS) tri-layer films were deposited on glass substrates by magnetron sputtering, and then the surface was subjected to intense electron beam irradiation to investigate the effects of electron irradiation on the structural, optical, and electrical properties of the films. After deposition,.....
More
Web of Science 4
Crossref 3
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Korean J. Met. Mater.
2019;57(8):506-509. Published online 2019 Aug 5
DOI:
https://doi.org/10.3365/KJMM.2019.57.8.506
Abstract
ZnO 50 nm/Ag 10 nm/SnO
2
50 nm (ZAS) tri-layer films were deposited on a glass substrate by RF and DC magnetron sputtering and then underwent rapid thermal annealing in a low vacuum of 1×10
-3
Torr to investigate the effects of post-deposition annealing on the optical and electrical properties of the.....
More
Web of Science 5
Crossref 4
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Korean J. Met. Mater.
2019;57(7):462-467. Published online 2019 Jun 5
DOI:
https://doi.org/10.3365/KJMM.2019.57.7.462
Abstract
In this work, the angular distribution of the sputtered Cu flux in a long throw sputtering (LTS) system is extracted from the comparison of experimentally-measured profiles of deposited films with simulated profiles of films in overhang contact structure. And effects of the sputtering process parameters such as Ar pressure during.....
More
Web of Science 1
Crossref 1
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TiO
2
/TiO
2-x
박막층의 두께가 멤리스터 소자의 특성에 미치는 영향
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김한상, 김성진
Korean J. Met. Mater.
2019;57(2):84-90. Published online 2019 Feb 5
DOI:
https://doi.org/10.3365/KJMM.2019.57.2.84
Abstract
Memristors have been extensively investigated as the fourth fundamental circuit element. Titanium oxide is a common material used to fabricate memristors. In this paper, we investigated the influence of the thickness of the oxide active layer on the Al/TiO2-x/TiO2/heavily doped electrode memristor architecture. An insulating TiO2 thin-film was deposited using.....
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Web of Science 6
Crossref 6
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