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Effect of Process Parameters on the Angular Distribution of Sputtered Cu Flux in Long-Throw Sputtering System
Hee-Young Shin, Tae-Ho Kim, Jun-Woo Park, Hyun-Chul Sohn
Korean J. Met. Mater. 2019;57(7):462-467.   Published online 2019 Jun 5
DOI: https://doi.org/10.3365/KJMM.2019.57.7.462

Abstract
In this work, the angular distribution of the sputtered Cu flux in a long throw sputtering (LTS) system is extracted from the comparison of experimentally-measured profiles of deposited films with simulated profiles of films in overhang contact structure. And effects of the sputtering process parameters such as Ar pressure during..... More

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