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Diagnosis of Mechanoluminescent Crack Based on Double Deep Learning in Al 7075
이중 인공지능을 이용한 Al 7075 합금에서의 압광 균열 진단 연구
Tae O Park, Youn Woo Shin, Seung Hwan Lee, Pius Jwa, Yong Nam Kwon, Suman Timilsina, Seong Min Jang, Chul Woo Jo, Ji Sik Kim
박태오, 신윤우, 이승환, 좌비오, 권용남, Suman Timilsina, 장성민, 조철우, 김지식
Korean J. Met. Mater. 2023;61(12):958-964.   Published online 2023 Nov 30
DOI: https://doi.org/10.3365/KJMM.2023.61.12.958

Abstract
The phenomenon of mechanoluminescence (ML) refers to the emission of light induced by mechanical stimulation applied to mechano-optical materials for example SrAl2O3:Eu,Dy (SAO). Numerous technologies on the basis of ML have been presented to visualize the stress or strain in various structures for the applications including structural health monitoring. As..... More

                
Effect of UV Irradiation on Optical Properties of Water-Based Synthetic Zinc Selenide Quantum Dots
자외선 조사가 수계 용매에서 합성된 셀렌화 아연 양자점의 광학특성에 미치는 영향
Geum Ji Back, Yu Jin Kang, I Ju Kang, Jeong Hyeon Lim, Hyun Seon Hong
백금지, 강유진, 강이주, 임정현, 홍현선
Korean J. Met. Mater. 2022;60(2):160-167.   Published online 2022 Jan 12
DOI: https://doi.org/10.3365/KJMM.2022.60.2.160

Abstract
ZnSe quantum-dots were synthesized in an aqueous system and UV irradiation was introduced as a post-treatment process. The synthesis temperature was varied from 25 oC to 90 oC, and the surface of the nano powder was stabilized using different ligands such as glutathione (GSH), 3-mercaptopropionic acid (MPA) and thioglycolic acid..... More

                
A Study on How the Photoreflectance Characteristic in the Al<sub>0.21</sub>Ga<sub>0.79</sub>As/GaAs Heterostructure Affects Variable Pumping Intensity
Al0.21Ga0.79As/GaAs의 변조 빔의 세기에 대한 광반사도 특성 연구
Kyeong Su Choi, Soon-Don Choi, Jae-In Yu
최경수, 최순돈, 유재인
Korean J. Met. Mater. 2017;55(8):587-590.   Published online 2017 Aug 1
DOI: https://doi.org/10.3365/KJMM.2017.55.8.587

Abstract
The photoreflectance (PR) method is advantageous in that it is more convenient to use at low temperature and high temperature than electroreflectance (ER) due to the modulation of the electric field. This is caused by the recombination of the surface state charge and the minority carriers generated by the laser..... More

    
Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet Lithography
극자외선 노광공정에서의 사이드 로브 세기와 포톤 샷 노이즈 효과가 컨택 홀 missing 현상에 미치는 영향
Jung Sik Kim, Seongchul Hong, Yong Ju Jang, Jinho Ahn
김정식, 홍성철, 장용주, 안진호
Korean J. Met. Mater. 2017;55(2):139-143.   Published online 2017 Feb 2
DOI: https://doi.org/10.3365/KJMM.2017.55.2.139

Abstract
The missing hole phenomenon in a wafer pattern is a critical issue in extreme ultraviolet lithography. It occurs randomly, even when the process conditions are consistent. The main reason for this phenomenon is thought to be the photon shot noise effect, which is a random reaction between photons and photoresist..... More

    
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