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Enhanced Optical and Electrical Properties of Ti Doped In<sub>2</sub>O<sub>3</sub> thin Films Treated by Post-deposition Electron Beam Irradiation
Su-Hyeon Choe, Yun-Je Park, Yu-Sung Kim, Byung-Chul Cha, Sung-Bo Heo, Sungook Yoon, Young-Min Kong, Daeil Kim
Korean J. Met. Mater. 2020;58(11):793-797.   Published online 2020 Oct 15
DOI: https://doi.org/10.3365/KJMM.2020.58.11.793

Abstract
Transparent and conductive Ti doped In2O3 (TIO) films were prepared on slide glass substrate using a radio frequency (RF) magnetron sputter and then subjected to Transparent and conductive Ti doped In2O3 (TIO) films were prepared on a glass slide substrate using radio frequency (RF) magnetron sputter. The film surface was..... More

                        
Electron Irradiation Effects on the Optical and Electrical Properties of ZnO/Ag/SnO<sub>2</sub> Thin Films
Yu-Sung Kim, Jin-Young Choi, Yun-je park, Su-Hyeon Choe, Byung-Chul Cha, Young-Min Kong, Daeil Kim
Korean J. Met. Mater. 2020;58(3):190-194.   Published online 2020 Mar 5
DOI: https://doi.org/10.3365/KJMM.2020.58.3.190

Abstract
Transparent conductive ZnO 50 nm/Ag 10 nm/SnO2 50 nm (ZAS) tri-layer films were deposited on glass substrates by magnetron sputtering, and then the surface was subjected to intense electron beam irradiation to investigate the effects of electron irradiation on the structural, optical, and electrical properties of the films. After deposition,..... More

                           Cited By 1
Enhancement of the Opto-Electrical Properties of Ag Intermediate ZTO Films by Vacuum Annealing
Hyun-Joo Moon, Daeil Kim
Korean J. Met. Mater. 2017;55(3):209-212.   Published online 2017 Mar 3
DOI: https://doi.org/10.3365/KJMM.2017.55.3.209

Abstract
Sn-doped ZnO (ZTO)/Ag/ZTO tri-layer films were deposited on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering and then vacuum annealed at 100, 200 and 300 ℃ for 30 min with a proportions of H2/N2 gas flow of 6/6 sccm, to investigate the effects of annealing temperature..... More

      
Effect of Post-Deposition Annealing on the Structural, Optical and Electrical Properties of Ti-doped Indium Oxide Thin Films
Sung-Bo Heo, Hyun-Joo Moon, Jeong-Hyeon Oh, Young-Hwan Song, Tae-Young Eom, Jun-Ho Kim, Daeil Kim
Korean J. Met. Mater. 2016;54(10):775-779.   Published online 2016 Oct 5
DOI: https://doi.org/10.3365/KJMM.2016.54.10.775

Abstract
Ti-doped In2O3 (TIO) thin films were deposited on glass substrates by RF magnetron sputtering. The films were then annealed at 100, 200 or 300 °C for 30 min to investigate the effects of the annealing temperature on the films’ structural, electrical and optical properties. The films annealed at 200 °C..... More

      
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