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Jinho Ahn 2 Articles
198 Study of Novel EUV Absorber:Nickel & Nickel Oxide
새로운 EUV 흡수체 연구:니켈 & 니켈 산화물
Dong Gon Woo, Jung Hwan Kim, Jung Sik Kim, Seongchul Hong, Jinho Ahn
우동곤, 김정환, 김정식, 홍성철, 안진호
Korean J. Met. Mater. 2017;55(3):198-201.   Published online 2017 Mar 3
DOI: https://doi.org/10.3365/KJMM.2017.55.3.198
Abstract
The shadowing effect is one of the most urgent issues yet to be solved in high-volume manufacturing using extreme ultraviolet lithography (EUVL). Many studies have been conducted to mitigate the unexpected results caused by shadowing effects. The simplest way to mitigate the shadowing effect is to reduce the thickness of... More
         Cited By 1
139 Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet Lithography
극자외선 노광공정에서의 사이드 로브 세기와 포톤 샷 노이즈 효과가 컨택 홀 missing 현상에 미치는 영향
Jung Sik Kim, Seongchul Hong, Yong Ju Jang, Jinho Ahn
김정식, 홍성철, 장용주, 안진호
Korean J. Met. Mater. 2017;55(2):139-143.   Published online 2017 Feb 2
DOI: https://doi.org/10.3365/KJMM.2017.55.2.139

Abstract
The missing hole phenomenon in a wafer pattern is a critical issue in extreme ultraviolet lithography. It occurs randomly, even when the process conditions are consistent. The main reason for this phenomenon is thought to be the photon shot noise effect, which is a random reaction between photons and photoresist..... More

      
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